Past Event

Atomic Layer Deposition (ALD'13)

28–31 July 2013
San Diego, United States

The AVS Topical Conference on Atomic Layer Deposition (ALD 2013) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications.

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