Important dates:

  • Abstract submission15 June 2014
  • Acceptance notification15 July 2014
  • Early bird registration28 August 2014

The LEEM/PEEM workshop is a biennial meeting reviewing the status of immersion lens microscopies such as Low Energy Electron Microscopy (LEEM), Photoelectron Emission Microscopy (PEEM), Spin-polarized LEEM (SPLEEM), X-Ray PEEM (XPEEM) and related microscopy and spectromicroscopy techniques. The first of these workshops was held in Tempe, Arizona, in 1998. Since then, the venue has moved between America, Europe and Asia. The main aim of the meeting is to discuss scientific advances in the fields of surface and solid state physics, disseminate knowledge and promote applications of cathode lens microscopy to a broad audience of interested scientists.

LEEM/PEEM 9 highlights the most recent scientific advances and instrumental developments in the field of cathode lens microscopy. Topics covered will include: 

  •            Surfaces
  •            Thin films
  •            Nanoparticles
  •            Organic films
  •            Surface chemistry
  •            Magnetism
  •            Spintronics
  •            Time-resolved methods
  •            Instrumental advances
  •            Novel applications of LEEM and PEEM

The programme will consist of oral, poster and tutorial sessions. The tradition of LEEM/PEEM having a single-session structure will also be upheld this year.

If you would like to present your work in the field of immersion lens microscopy in September in Berlin, please submit your abstract for consideration to http://www.fz-juelich.de/pgi/EN/Leistungen/ConferencesAndWorkshops/LEEMPEEM-9/AbstractSubmission/_node.html  by 1 June, 2014!

LP-9 Workshop Proceedings will be published in Ultramicroscopy!

For further information and regular updates on the LEEM/PEEM 9 Workshop please visit the official LP-9 website 

http://www.fz-juelich.de/pgi/LEEMPEEM-9/

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